NANOMATERIALS AND NANOTECHNOLOGY | |
ArticleName | Xps phase composition study of por−Si/SnOx nanocomposite samples exposed to thermal oxidation |
ArticleAuthor | V. V. Bolotov, S. N. Nesov, P. M. Korusenko, S. N. Povoroznyuk |
ArticleAuthorData | Omsk Branch, Institute of Semiconductor Physics, Siberian Branch of RAS V. V. Bolotov, S. N. Nesov, P. M. Korusenko, S. N. Povoroznyuk |
Abstract | Results of XPS and AES investigation of por−Si/SnOx nanocomposite samples after different modes of heat treatment have been presented. We show that thermal treatment increases the penetration depth of tin and the stoichiometric coefficient x of the SnOx compound. However, annealing at 600 °C leads to a strong oxidation of the porous matrix and eventual blockage of the tin diffusion channels. Optimization of the heat treatment modes allows one to obtain nanocomposite layers with a sufficient thickness of the por−Si/SnOx nanocomposite for use in gas microsensors. |
keywords | Porous silicon, nanostructures, X−ray photoelectron spectroscopy, Auger electron spectroscopy |
References | 1. Amato, G. On the apparently anomalous response of porous silicon to nitrogen dioxide / G. Amato, L. Boarino, F. Bellotti // Appl. Phys. Lett. − 2004. − V. 85. − P. 4409—4411. |
Language of full-text | russian |
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