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NANOMATERIALS AND NANOTECHNOLOGY
ArticleName Xps phase composition study of por−Si/SnOx nanocomposite samples exposed to thermal oxidation
ArticleAuthor V. V. Bolotov, S. N. Nesov, P. M. Korusenko, S. N. Povoroznyuk
ArticleAuthorData

Omsk Branch, Institute of Semiconductor Physics, Siberian Branch of RAS

V. V. Bolotov, S. N. Nesov, P. M. Korusenko, S. N. Povoroznyuk

Abstract

Results of XPS and AES investigation of por−Si/SnOx nanocomposite samples after different modes of heat treatment have been presented. We show that thermal treatment increases the penetration depth of tin and the stoichiometric coefficient x of the SnOx compound. However, annealing at 600 °C leads to a strong oxidation of the porous matrix and eventual blockage of the tin diffusion channels. Optimization of the heat treatment modes allows one to obtain nanocomposite layers with a sufficient thickness of the por−Si/SnOx nanocomposite for use in gas microsensors.

keywords Porous silicon, nanostructures, X−ray photoelectron spectroscopy, Auger electron spectroscopy
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