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MATERIALS SCIENCE AND TECHNOLOGY. SEMICONDUCTORS
ArticleName SIMULATION OF COALESCENCE OF PRIMARY GROWTH DEFECTS IN DISLOCATION-FREE SILICON SINGLE CRYSTALS
ArticleAuthor V.I. Talanin, I.E. Talanin, A.I. Mazurskii and M.L. Maksimchuk,
ArticleAuthorData V.I. Talanin, I.E. Talanin, A.I. Mazurskii and M.L. Maksimchuk, Classical Private University, Ukraine
Abstract An analytical expression of primary growth defect size distribution function has been obtained. We have shown that the coalescence stage of primary growth defects is not a time-limited process and occurs concurrently with defect formation.
keywords Microdefects, silicon single crystals, coalescence, kinetics, precipitation.
Language of full-text russian
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