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EPITAXIAL LAYERS AND MULTILAYERED COMPOSITIONS
ArticleName Prediction the Influence of Technological Parameters of Formation of Gas−sensing Materials Based on Polyacrylonitrile on Resistance
ArticleAuthor S. P. Konovalenko, T. A. Bednaya, T. V. Semenistaya, A. N. Korolev
ArticleAuthorData

Taganrog State Pedagogical Institute

S. P. Konovalenko, T. A. Bednaya

 

Technological institute of Southern Federal university in g. Taganrog

T. V. Semenistaya, A. N. Korolev

Abstract

Samples of polyacrylonitrile (PAN) films and cobalt−containing PAN films have been fabricated by method of not coherent IR−radiation. It is constructed QSPR model, allowing to relate values of resistance of PAN films and Co−containing PAN films with parameters of technological process of formation of gas−sensing materials based on them. It is established that resistance of the obtained materials depends on temperature and time of the second stage of IR−pyrolize and on dopant concentration.

keywords Nanocomposite materials, QSPR, gas−sensing materials, metal−containing organic polymers, IR−pyrolize
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