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EPITAXIAL LAYERS AND MULTILAYERED COMPOSITIONS
ArticleName Study of Electrical Properties of Schottky Diodes Fabricated on Silicon with Different Metal Layers
ArticleAuthor I. G. Pashayev
ArticleAuthorData

Baku State University, Azerbaijan Republic:

I. G. Pashayev

Abstract

We have investigated the fabrication of AuxTi100−xnSi (where x is 10; 36; 87) and PbxSb100−xnSi (where x = 52; 70; 87) Schottky diodes and the electrical properties of AuxTi100−xnSi (where x = 10; 36; 87) and PbxSb100−xnSi (where x = 52; 70; 87)Schottky diodes. The Au36Ti64, Pb52Sb48 alloy film has an amorphous structure, while the other films are polycrystalline. We have determined Schottky barrier height depending on the composition and structure of the metal films and found that the barrier height is quite sensitive to the composition of the metal alloy. We show that the electrical properties of the AuxTi100−xnS and PbxSb100−xnSi Schottky diodes depend on the composition and structure of the metal films.

keywords Thermal anneal, amorphous metals, Schottky diodes, alloy film, barrier height
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